Professor Lauri Niinistö has been honoured with the first ever GerALD award at the 2010 Baltic ALD conference held in Germany. GerALd is an association of scientists performing research on atomic layer deposition.
The GerALD organization committee decided to present the first GerALD award to honour someone who has significantly contributed to the development of the atomic layer deposition, or ALD research in Germany.
– Lauri Niinistö was one of the scientists who were willing to help German newcomers in the field. He had much collaboration particularly with German chemists in developing new precursor materials which in his group subsequently have been tested for their performance as ALD precursors. Today groups tutored by him perform their research on their own, having benefited from the collaboration with Niinistö, says Dr. Mato Knez from the Max Planck Institute of Microstructure Physics in Halle.
The GerALD organization committee emphasised Lauri Niinistö’s original and significant contribution to the development of the ALD research in Germany.
– Ten years ago, Germany did not produce any significant ALD research. However, in the recent years, the situation has changed and today Germany resides among the top countries in this field, Lauri Niinistö mentioned in his speech at the Baltic ALD conference.
Professor Niinistö is a Member of the Board of Directors of Picosun. Finnish Picosun develops and manufactures ALD systems for micro- and nanotechnology applications.